Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser

We report the imprinting of nanometer-scale gratings by interferometric lithography at λ = 46.9 nm using an Ne-like Ar capillary discharge laser. Gratings with periods as small as 55 nm were imprinted on poly-methyl methacrylate using a Lloyd's mirror interferometer. This first demonstration of...

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Detalles Bibliográficos
Autores principales:	Capeluto, M.G., Vaschenko, G., Grisham, M., Marconi, M.C., Ludueña, S., Pietrasanta, L., Lu, Y., Parkinson, B., Menoni, C.S., Rocca, J.J.
Formato:	JOUR
Materias:	Nanotechnology Photolithography X-ray lasers X-ray lithography EUV lasers Interferometry Lasers Pattern recognition Polymethyl methacrylates Ultraviolet radiation
Acceso en línea:	http://hdl.handle.net/20.500.12110/paper_1536125X_v5_n1_p3_Capeluto
Aporte de:	Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires

id	todo:paper_1536125X_v5_n1_p3_Capeluto
record_format	dspace
spelling	todo:paper_1536125X_v5_n1_p3_Capeluto2023-10-03T16:21:46Z Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser Capeluto, M.G. Vaschenko, G. Grisham, M. Marconi, M.C. Ludueña, S. Pietrasanta, L. Lu, Y. Parkinson, B. Menoni, C.S. Rocca, J.J. Nanotechnology Photolithography X-ray lasers X-ray lithography EUV lasers X-ray lasers X-ray lithography Interferometry Lasers Nanotechnology Pattern recognition Polymethyl methacrylates Ultraviolet radiation Photolithography We report the imprinting of nanometer-scale gratings by interferometric lithography at λ = 46.9 nm using an Ne-like Ar capillary discharge laser. Gratings with periods as small as 55 nm were imprinted on poly-methyl methacrylate using a Lloyd's mirror interferometer. This first demonstration of nanopatterning using an extreme ultraviolet (EUV) laser illustrates the potential of compact EUV lasers in nanotechnology applications. © 2006 IEEE. JOUR info:eu-repo/semantics/openAccess http://creativecommons.org/licenses/by/2.5/ar http://hdl.handle.net/20.500.12110/paper_1536125X_v5_n1_p3_Capeluto
institution	Universidad de Buenos Aires
institution_str	I-28
repository_str	R-134
collection	Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA)
topic	Nanotechnology Photolithography X-ray lasers X-ray lithography EUV lasers X-ray lasers X-ray lithography Interferometry Lasers Nanotechnology Pattern recognition Polymethyl methacrylates Ultraviolet radiation Photolithography
spellingShingle	Nanotechnology Photolithography X-ray lasers X-ray lithography EUV lasers X-ray lasers X-ray lithography Interferometry Lasers Nanotechnology Pattern recognition Polymethyl methacrylates Ultraviolet radiation Photolithography Capeluto, M.G. Vaschenko, G. Grisham, M. Marconi, M.C. Ludueña, S. Pietrasanta, L. Lu, Y. Parkinson, B. Menoni, C.S. Rocca, J.J. Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser
topic_facet	Nanotechnology Photolithography X-ray lasers X-ray lithography EUV lasers X-ray lasers X-ray lithography Interferometry Lasers Nanotechnology Pattern recognition Polymethyl methacrylates Ultraviolet radiation Photolithography
description	We report the imprinting of nanometer-scale gratings by interferometric lithography at λ = 46.9 nm using an Ne-like Ar capillary discharge laser. Gratings with periods as small as 55 nm were imprinted on poly-methyl methacrylate using a Lloyd's mirror interferometer. This first demonstration of nanopatterning using an extreme ultraviolet (EUV) laser illustrates the potential of compact EUV lasers in nanotechnology applications. © 2006 IEEE.
format	JOUR
author	Capeluto, M.G. Vaschenko, G. Grisham, M. Marconi, M.C. Ludueña, S. Pietrasanta, L. Lu, Y. Parkinson, B. Menoni, C.S. Rocca, J.J.
author_facet	Capeluto, M.G. Vaschenko, G. Grisham, M. Marconi, M.C. Ludueña, S. Pietrasanta, L. Lu, Y. Parkinson, B. Menoni, C.S. Rocca, J.J.
author_sort	Capeluto, M.G.
title	Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser
title_short	Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser
title_full	Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser
title_fullStr	Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser
title_full_unstemmed	Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser
title_sort	nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser
url	http://hdl.handle.net/20.500.12110/paper_1536125X_v5_n1_p3_Capeluto
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Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser

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