Interferometric lithography at 46.9 nm

We present the first results of nano-patterning in poly-methyl methacrylate (PMMA) photo-resist using a 46.9 nm tabletop extreme ultraviolet (EUV) laser. As a proof of principle, we recorded a Fresnel diffraction pattern of a copper mesh with 19 μm square holes. Results of ongoing interference exper...

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Autores principales: Capeluto, M.G., Vaschenko, G., Grisham, M.E., Marconi, M.C., Menoni, C.S., Rocca, J.J., Ludueña, S., Pietrasanta, L., Marcano O. A., Paz J.L.
Formato: CONF
Materias:
EUV lithography
Interferometric lithography
Nanopatterning
Electromagnetic wave diffraction
Electrons
Interferometry
Laser applications
Polymethyl methacrylates
Ultraviolet radiation
Laser source
Lithography
Acceso en línea:http://hdl.handle.net/20.500.12110/paper_0277786X_v5622_nPART2_p735_Capeluto
Aporte de:
Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires
id todo:paper_0277786X_v5622_nPART2_p735_Capeluto
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spelling todo:paper_0277786X_v5622_nPART2_p735_Capeluto2023-10-03T15:16:30Z Interferometric lithography at 46.9 nm Capeluto, M.G. Vaschenko, G. Grisham, M.E. Marconi, M.C. Menoni, C.S. Rocca, J.J. Ludueña, S. Pietrasanta, L. Marcano O. A. Paz J.L. EUV lithography Interferometric lithography Nanopatterning Electromagnetic wave diffraction Electrons Interferometry Laser applications Polymethyl methacrylates Ultraviolet radiation EUV lithography Interferometric lithography Laser source Nanopatterning Lithography We present the first results of nano-patterning in poly-methyl methacrylate (PMMA) photo-resist using a 46.9 nm tabletop extreme ultraviolet (EUV) laser. As a proof of principle, we recorded a Fresnel diffraction pattern of a copper mesh with 19 μm square holes. Results of ongoing interference experiments will also be presented. CONF info:eu-repo/semantics/openAccess http://creativecommons.org/licenses/by/2.5/ar http://hdl.handle.net/20.500.12110/paper_0277786X_v5622_nPART2_p735_Capeluto
institution Universidad de Buenos Aires
institution_str I-28
repository_str R-134
collection Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA)
topic EUV lithography
Interferometric lithography
Nanopatterning
Electromagnetic wave diffraction
Electrons
Interferometry
Laser applications
Polymethyl methacrylates
Ultraviolet radiation
EUV lithography
Interferometric lithography
Laser source
Nanopatterning
Lithography
spellingShingle EUV lithography
Interferometric lithography
Nanopatterning
Electromagnetic wave diffraction
Electrons
Interferometry
Laser applications
Polymethyl methacrylates
Ultraviolet radiation
EUV lithography
Interferometric lithography
Laser source
Nanopatterning
Lithography
Capeluto, M.G.
Vaschenko, G.
Grisham, M.E.
Marconi, M.C.
Menoni, C.S.
Rocca, J.J.
Ludueña, S.
Pietrasanta, L.
Marcano O. A.
Paz J.L.
Interferometric lithography at 46.9 nm
topic_facet EUV lithography
Interferometric lithography
Nanopatterning
Electromagnetic wave diffraction
Electrons
Interferometry
Laser applications
Polymethyl methacrylates
Ultraviolet radiation
EUV lithography
Interferometric lithography
Laser source
Nanopatterning
Lithography
description We present the first results of nano-patterning in poly-methyl methacrylate (PMMA) photo-resist using a 46.9 nm tabletop extreme ultraviolet (EUV) laser. As a proof of principle, we recorded a Fresnel diffraction pattern of a copper mesh with 19 μm square holes. Results of ongoing interference experiments will also be presented.
format CONF
author Capeluto, M.G.
Vaschenko, G.
Grisham, M.E.
Marconi, M.C.
Menoni, C.S.
Rocca, J.J.
Ludueña, S.
Pietrasanta, L.
Marcano O. A.
Paz J.L.
author_facet Capeluto, M.G.
Vaschenko, G.
Grisham, M.E.
Marconi, M.C.
Menoni, C.S.
Rocca, J.J.
Ludueña, S.
Pietrasanta, L.
Marcano O. A.
Paz J.L.
author_sort Capeluto, M.G.
title Interferometric lithography at 46.9 nm
title_short Interferometric lithography at 46.9 nm
title_full Interferometric lithography at 46.9 nm
title_fullStr Interferometric lithography at 46.9 nm
title_full_unstemmed Interferometric lithography at 46.9 nm
title_sort interferometric lithography at 46.9 nm
url http://hdl.handle.net/20.500.12110/paper_0277786X_v5622_nPART2_p735_Capeluto
work_keys_str_mv AT capelutomg interferometriclithographyat469nm
AT vaschenkog interferometriclithographyat469nm
AT grishamme interferometriclithographyat469nm
AT marconimc interferometriclithographyat469nm
AT menonics interferometriclithographyat469nm
AT roccajj interferometriclithographyat469nm
AT luduenas interferometriclithographyat469nm
AT pietrasantal interferometriclithographyat469nm
AT marcanooa interferometriclithographyat469nm
AT pazjl interferometriclithographyat469nm
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