Table top nanopatterning with extreme ultraviolet laser illumination

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Patterning with extreme ultraviolet light generated by a compact, bright laser source operating at a wavelength of 46.9 nm is demonstrated using two complementary approaches: multiple beam interferometric lithography and de-magnifying projection. Features with sizes ranging from 370 nm to 60 nm were...

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Detalles Bibliográficos
Autores principales: Capeluto, M.G., Wachulak, P., Marconi, M.C., Patel, D., Menoni, C.S., Rocca, J.J., Iemmi, C., Anderson, E.H., Chao, W., Attwood, D.T.
Formato: JOUR
Materias:
EUV lasers
Interferometric lithography
Nanopatterning
Table top photolithography
Laser interferometry
Lithography
Nanotechnology
Polymethyl methacrylates
Ultraviolet radiation
Wavelength
Lasers
Acceso en línea:http://hdl.handle.net/20.500.12110/paper_01679317_v84_n5-8_p721_Capeluto
Aporte de:
Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires
Descripción
Sumario:Patterning with extreme ultraviolet light generated by a compact, bright laser source operating at a wavelength of 46.9 nm is demonstrated using two complementary approaches: multiple beam interferometric lithography and de-magnifying projection. Features with sizes ranging from 370 nm to 60 nm were printed in a few seconds in poly-methyl methacrylate resist. These proof-of-principle experiments demonstrate practical table-top nanopatterning tools based on extreme ultraviolet lasers for nanotechnology applications. © 2007 Elsevier B.V. All rights reserved.

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