Table top nanopatterning with extreme ultraviolet laser illumination
Patterning with extreme ultraviolet light generated by a compact, bright laser source operating at a wavelength of 46.9 nm is demonstrated using two complementary approaches: multiple beam interferometric lithography and de-magnifying projection. Features with sizes ranging from 370 nm to 60 nm were...
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| Formato: | JOUR |
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| Acceso en línea: | http://hdl.handle.net/20.500.12110/paper_01679317_v84_n5-8_p721_Capeluto |
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todo:paper_01679317_v84_n5-8_p721_Capeluto2023-10-03T15:05:32Z Table top nanopatterning with extreme ultraviolet laser illumination Capeluto, M.G. Wachulak, P. Marconi, M.C. Patel, D. Menoni, C.S. Rocca, J.J. Iemmi, C. Anderson, E.H. Chao, W. Attwood, D.T. EUV lasers Interferometric lithography Nanopatterning Table top photolithography Laser interferometry Lithography Nanotechnology Polymethyl methacrylates Ultraviolet radiation Wavelength EUV lasers Interferometric lithography Nanopatterning Table top photolithography Lasers Patterning with extreme ultraviolet light generated by a compact, bright laser source operating at a wavelength of 46.9 nm is demonstrated using two complementary approaches: multiple beam interferometric lithography and de-magnifying projection. Features with sizes ranging from 370 nm to 60 nm were printed in a few seconds in poly-methyl methacrylate resist. These proof-of-principle experiments demonstrate practical table-top nanopatterning tools based on extreme ultraviolet lasers for nanotechnology applications. © 2007 Elsevier B.V. All rights reserved. Fil:Capeluto, M.G. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Marconi, M.C. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Iemmi, C. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. JOUR info:eu-repo/semantics/openAccess http://creativecommons.org/licenses/by/2.5/ar http://hdl.handle.net/20.500.12110/paper_01679317_v84_n5-8_p721_Capeluto |
| institution |
Universidad de Buenos Aires |
| institution_str |
I-28 |
| repository_str |
R-134 |
| collection |
Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) |
| topic |
EUV lasers Interferometric lithography Nanopatterning Table top photolithography Laser interferometry Lithography Nanotechnology Polymethyl methacrylates Ultraviolet radiation Wavelength EUV lasers Interferometric lithography Nanopatterning Table top photolithography Lasers |
| spellingShingle |
EUV lasers Interferometric lithography Nanopatterning Table top photolithography Laser interferometry Lithography Nanotechnology Polymethyl methacrylates Ultraviolet radiation Wavelength EUV lasers Interferometric lithography Nanopatterning Table top photolithography Lasers Capeluto, M.G. Wachulak, P. Marconi, M.C. Patel, D. Menoni, C.S. Rocca, J.J. Iemmi, C. Anderson, E.H. Chao, W. Attwood, D.T. Table top nanopatterning with extreme ultraviolet laser illumination |
| topic_facet |
EUV lasers Interferometric lithography Nanopatterning Table top photolithography Laser interferometry Lithography Nanotechnology Polymethyl methacrylates Ultraviolet radiation Wavelength EUV lasers Interferometric lithography Nanopatterning Table top photolithography Lasers |
| description |
Patterning with extreme ultraviolet light generated by a compact, bright laser source operating at a wavelength of 46.9 nm is demonstrated using two complementary approaches: multiple beam interferometric lithography and de-magnifying projection. Features with sizes ranging from 370 nm to 60 nm were printed in a few seconds in poly-methyl methacrylate resist. These proof-of-principle experiments demonstrate practical table-top nanopatterning tools based on extreme ultraviolet lasers for nanotechnology applications. © 2007 Elsevier B.V. All rights reserved. |
| format |
JOUR |
| author |
Capeluto, M.G. Wachulak, P. Marconi, M.C. Patel, D. Menoni, C.S. Rocca, J.J. Iemmi, C. Anderson, E.H. Chao, W. Attwood, D.T. |
| author_facet |
Capeluto, M.G. Wachulak, P. Marconi, M.C. Patel, D. Menoni, C.S. Rocca, J.J. Iemmi, C. Anderson, E.H. Chao, W. Attwood, D.T. |
| author_sort |
Capeluto, M.G. |
| title |
Table top nanopatterning with extreme ultraviolet laser illumination |
| title_short |
Table top nanopatterning with extreme ultraviolet laser illumination |
| title_full |
Table top nanopatterning with extreme ultraviolet laser illumination |
| title_fullStr |
Table top nanopatterning with extreme ultraviolet laser illumination |
| title_full_unstemmed |
Table top nanopatterning with extreme ultraviolet laser illumination |
| title_sort |
table top nanopatterning with extreme ultraviolet laser illumination |
| url |
http://hdl.handle.net/20.500.12110/paper_01679317_v84_n5-8_p721_Capeluto |
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