Comparative analysis of MIS capacitive structures with high-K dielectrics under gamma, 16O and p radiation
MIS capacitive structures were studied under gamma, 16O and p radiation. The effects observed were registered employing C-V curves. Those showed different characteristics depending on the type of radiation and dielectric. © 2011 IEEE.
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Acceso en línea: | http://hdl.handle.net/20.500.12110/paper_97814577_v_n_p67_Quinteros |
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todo:paper_97814577_v_n_p67_Quinteros2023-10-03T16:43:24Z Comparative analysis of MIS capacitive structures with high-K dielectrics under gamma, 16O and p radiation Quinteros, C. Sambuco Salomone, L. Redín, E. Rafí, J.M. Zabala, M. Faigón, A. Palumbo, F. Campabadal, F. High-K gate dielectrics MOS devices Radiation Effects C-V curve Capacitive structure Comparative analysis High-k dielectric High-k gate dielectrics Dielectric materials MOS devices Radiation effects MIS capacitive structures were studied under gamma, 16O and p radiation. The effects observed were registered employing C-V curves. Those showed different characteristics depending on the type of radiation and dielectric. © 2011 IEEE. CONF info:eu-repo/semantics/openAccess http://creativecommons.org/licenses/by/2.5/ar http://hdl.handle.net/20.500.12110/paper_97814577_v_n_p67_Quinteros |
institution |
Universidad de Buenos Aires |
institution_str |
I-28 |
repository_str |
R-134 |
collection |
Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) |
topic |
High-K gate dielectrics MOS devices Radiation Effects C-V curve Capacitive structure Comparative analysis High-k dielectric High-k gate dielectrics Dielectric materials MOS devices Radiation effects |
spellingShingle |
High-K gate dielectrics MOS devices Radiation Effects C-V curve Capacitive structure Comparative analysis High-k dielectric High-k gate dielectrics Dielectric materials MOS devices Radiation effects Quinteros, C. Sambuco Salomone, L. Redín, E. Rafí, J.M. Zabala, M. Faigón, A. Palumbo, F. Campabadal, F. Comparative analysis of MIS capacitive structures with high-K dielectrics under gamma, 16O and p radiation |
topic_facet |
High-K gate dielectrics MOS devices Radiation Effects C-V curve Capacitive structure Comparative analysis High-k dielectric High-k gate dielectrics Dielectric materials MOS devices Radiation effects |
description |
MIS capacitive structures were studied under gamma, 16O and p radiation. The effects observed were registered employing C-V curves. Those showed different characteristics depending on the type of radiation and dielectric. © 2011 IEEE. |
format |
CONF |
author |
Quinteros, C. Sambuco Salomone, L. Redín, E. Rafí, J.M. Zabala, M. Faigón, A. Palumbo, F. Campabadal, F. |
author_facet |
Quinteros, C. Sambuco Salomone, L. Redín, E. Rafí, J.M. Zabala, M. Faigón, A. Palumbo, F. Campabadal, F. |
author_sort |
Quinteros, C. |
title |
Comparative analysis of MIS capacitive structures with high-K dielectrics under gamma, 16O and p radiation |
title_short |
Comparative analysis of MIS capacitive structures with high-K dielectrics under gamma, 16O and p radiation |
title_full |
Comparative analysis of MIS capacitive structures with high-K dielectrics under gamma, 16O and p radiation |
title_fullStr |
Comparative analysis of MIS capacitive structures with high-K dielectrics under gamma, 16O and p radiation |
title_full_unstemmed |
Comparative analysis of MIS capacitive structures with high-K dielectrics under gamma, 16O and p radiation |
title_sort |
comparative analysis of mis capacitive structures with high-k dielectrics under gamma, 16o and p radiation |
url |
http://hdl.handle.net/20.500.12110/paper_97814577_v_n_p67_Quinteros |
work_keys_str_mv |
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