Rutile titanium dioxide films deposited with a vacuum arc at different temperatures

Rutile crystalline phase of TiO2 has been one of the most investigated materials for medical applications. Its implementation as a surface layer on biomedical implants has shown to improve hemocompatibility and biocompatibility. In this work, titanium dioxide coatings were deposited on glass and ste...

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Autores principales: Arias, L.F., Kleiman, A., Heredia, E., Márquez, A.
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Acceso en línea:http://hdl.handle.net/20.500.12110/paper_17426588_v370_n1_p_Arias
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spelling todo:paper_17426588_v370_n1_p_Arias2023-10-03T16:30:41Z Rutile titanium dioxide films deposited with a vacuum arc at different temperatures Arias, L.F. Kleiman, A. Heredia, E. Márquez, A. Biocompatibility Coatings Crystalline materials Deposition Medical applications Oxides Physical vapor deposition Substrates Titanium Titanium dioxide Vacuum applications X ray diffraction Biomedical implants Cathodic arc deposition Crystalline structure Deposition methods Different substrates Glancing angle x-ray diffractions Substrate material Titanium dioxide films Oxide minerals Rutile crystalline phase of TiO2 has been one of the most investigated materials for medical applications. Its implementation as a surface layer on biomedical implants has shown to improve hemocompatibility and biocompatibility. In this work, titanium dioxide coatings were deposited on glass and steel 316L substrates using cathodic arc deposition. The coatings were obtained at different substrate temperatures; varying from room temperature to 600°C. The crystalline structure of the films was identified by glancing angle X-ray diffraction. Depending on the substrate material and on its temperature during the deposition process, anatase, anatse+rutile and rutile structures were observed. It was determined that rutile films can be obtained below 600°C with this deposition method. CONF info:eu-repo/semantics/openAccess http://creativecommons.org/licenses/by/2.5/ar http://hdl.handle.net/20.500.12110/paper_17426588_v370_n1_p_Arias
institution Universidad de Buenos Aires
institution_str I-28
repository_str R-134
collection Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA)
topic Biocompatibility
Coatings
Crystalline materials
Deposition
Medical applications
Oxides
Physical vapor deposition
Substrates
Titanium
Titanium dioxide
Vacuum applications
X ray diffraction
Biomedical implants
Cathodic arc deposition
Crystalline structure
Deposition methods
Different substrates
Glancing angle x-ray diffractions
Substrate material
Titanium dioxide films
Oxide minerals
spellingShingle Biocompatibility
Coatings
Crystalline materials
Deposition
Medical applications
Oxides
Physical vapor deposition
Substrates
Titanium
Titanium dioxide
Vacuum applications
X ray diffraction
Biomedical implants
Cathodic arc deposition
Crystalline structure
Deposition methods
Different substrates
Glancing angle x-ray diffractions
Substrate material
Titanium dioxide films
Oxide minerals
Arias, L.F.
Kleiman, A.
Heredia, E.
Márquez, A.
Rutile titanium dioxide films deposited with a vacuum arc at different temperatures
topic_facet Biocompatibility
Coatings
Crystalline materials
Deposition
Medical applications
Oxides
Physical vapor deposition
Substrates
Titanium
Titanium dioxide
Vacuum applications
X ray diffraction
Biomedical implants
Cathodic arc deposition
Crystalline structure
Deposition methods
Different substrates
Glancing angle x-ray diffractions
Substrate material
Titanium dioxide films
Oxide minerals
description Rutile crystalline phase of TiO2 has been one of the most investigated materials for medical applications. Its implementation as a surface layer on biomedical implants has shown to improve hemocompatibility and biocompatibility. In this work, titanium dioxide coatings were deposited on glass and steel 316L substrates using cathodic arc deposition. The coatings were obtained at different substrate temperatures; varying from room temperature to 600°C. The crystalline structure of the films was identified by glancing angle X-ray diffraction. Depending on the substrate material and on its temperature during the deposition process, anatase, anatse+rutile and rutile structures were observed. It was determined that rutile films can be obtained below 600°C with this deposition method.
format CONF
author Arias, L.F.
Kleiman, A.
Heredia, E.
Márquez, A.
author_facet Arias, L.F.
Kleiman, A.
Heredia, E.
Márquez, A.
author_sort Arias, L.F.
title Rutile titanium dioxide films deposited with a vacuum arc at different temperatures
title_short Rutile titanium dioxide films deposited with a vacuum arc at different temperatures
title_full Rutile titanium dioxide films deposited with a vacuum arc at different temperatures
title_fullStr Rutile titanium dioxide films deposited with a vacuum arc at different temperatures
title_full_unstemmed Rutile titanium dioxide films deposited with a vacuum arc at different temperatures
title_sort rutile titanium dioxide films deposited with a vacuum arc at different temperatures
url http://hdl.handle.net/20.500.12110/paper_17426588_v370_n1_p_Arias
work_keys_str_mv AT ariaslf rutiletitaniumdioxidefilmsdepositedwithavacuumarcatdifferenttemperatures
AT kleimana rutiletitaniumdioxidefilmsdepositedwithavacuumarcatdifferenttemperatures
AT herediae rutiletitaniumdioxidefilmsdepositedwithavacuumarcatdifferenttemperatures
AT marqueza rutiletitaniumdioxidefilmsdepositedwithavacuumarcatdifferenttemperatures
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