Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology

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The design of a phase-shift interferometer in the extreme ultraviolet (EUV) is described. The interferometer is expected to achieve a significantly higher precision as compared with similar instruments that utilize lasers in the visible range. The interferometer's design is specifically adapted...

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Autores principales: Capeluto, M.G., Marconi, M.C., Iemmi, C.C.
Formato: JOUR
Materias:
Extreme ultraviolet lithography
Interferometers
Phase shift
Extreme Ultraviolet
Extreme ultraviolets
High-precision
Interferograms
Phase-shift interferometer
Phase-shifting interferometers
Pulsed capillary discharges
Visible range
Pulsed lasers
Acceso en línea:http://hdl.handle.net/20.500.12110/paper_1559128X_v_n7_p1274_Capeluto
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Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires
id todo:paper_1559128X_v_n7_p1274_Capeluto
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spelling todo:paper_1559128X_v_n7_p1274_Capeluto2023-10-03T16:26:11Z Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology Capeluto, M.G. Marconi, M.C. Iemmi, C.C. Extreme ultraviolet lithography Interferometers Phase shift Extreme Ultraviolet Extreme ultraviolets High-precision Interferograms Phase-shift interferometer Phase-shifting interferometers Pulsed capillary discharges Visible range Pulsed lasers The design of a phase-shift interferometer in the extreme ultraviolet (EUV) is described. The interferometer is expected to achieve a significantly higher precision as compared with similar instruments that utilize lasers in the visible range. The interferometer's design is specifically adapted for its utilization with a table top pulsed capillary discharge EUV laser. The numerical model evaluates the errors in the interferograms and in the retrieved wavefront induced by the shot-to-shot fluctuations and pointing instabilities of the laser. © 2014 Optical Society of America. Fil:Capeluto, M.G. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Marconi, M.C. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Iemmi, C.C. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. JOUR info:eu-repo/semantics/openAccess http://creativecommons.org/licenses/by/2.5/ar http://hdl.handle.net/20.500.12110/paper_1559128X_v_n7_p1274_Capeluto
institution Universidad de Buenos Aires
institution_str I-28
repository_str R-134
collection Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA)
topic Extreme ultraviolet lithography
Interferometers
Phase shift
Extreme Ultraviolet
Extreme ultraviolets
High-precision
Interferograms
Phase-shift interferometer
Phase-shifting interferometers
Pulsed capillary discharges
Visible range
Pulsed lasers
spellingShingle Extreme ultraviolet lithography
Interferometers
Phase shift
Extreme Ultraviolet
Extreme ultraviolets
High-precision
Interferograms
Phase-shift interferometer
Phase-shifting interferometers
Pulsed capillary discharges
Visible range
Pulsed lasers
Capeluto, M.G.
Marconi, M.C.
Iemmi, C.C.
Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology
topic_facet Extreme ultraviolet lithography
Interferometers
Phase shift
Extreme Ultraviolet
Extreme ultraviolets
High-precision
Interferograms
Phase-shift interferometer
Phase-shifting interferometers
Pulsed capillary discharges
Visible range
Pulsed lasers
description The design of a phase-shift interferometer in the extreme ultraviolet (EUV) is described. The interferometer is expected to achieve a significantly higher precision as compared with similar instruments that utilize lasers in the visible range. The interferometer's design is specifically adapted for its utilization with a table top pulsed capillary discharge EUV laser. The numerical model evaluates the errors in the interferograms and in the retrieved wavefront induced by the shot-to-shot fluctuations and pointing instabilities of the laser. © 2014 Optical Society of America.
format JOUR
author Capeluto, M.G.
Marconi, M.C.
Iemmi, C.C.
author_facet Capeluto, M.G.
Marconi, M.C.
Iemmi, C.C.
author_sort Capeluto, M.G.
title Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology
title_short Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology
title_full Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology
title_fullStr Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology
title_full_unstemmed Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology
title_sort design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology
url http://hdl.handle.net/20.500.12110/paper_1559128X_v_n7_p1274_Capeluto
work_keys_str_mv AT capelutomg designofaphaseshiftinginterferometerintheextremeultravioletforhighprecisionmetrology
AT marconimc designofaphaseshiftinginterferometerintheextremeultravioletforhighprecisionmetrology
AT iemmicc designofaphaseshiftinginterferometerintheextremeultravioletforhighprecisionmetrology
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