X-ray reflectivity analysis of titanium dioxide thin films grown by cathodic arc deposition

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TiO 2 thin films deposited by a vacuum arc on a glass substrate were characterized by X-ray reflectivity (XRR), X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM). Several thin films with different amounts of deposited TiO 2 mass and different deposition an...

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Detalles Bibliográficos
Autores principales: Kleiman, A., Lamas, D.G., Craievich, A.F., Márquez, A.
Formato: JOUR
Materias:
Cathodic Arc Deposition
Thin Films
X-Ray Reflectivity
Atomic force microscopy
Imaging techniques
Oxide minerals
Scanning electron microscopy
Substrates
Thin films
Titanium dioxide
Vacuum applications
X ray diffraction
Annealing temperatures
Cathodic arc deposition
Oscillatory behaviors
Qualitative analysis
TiO
Titanium dioxide thin film
X ray reflectivity
X-ray reflectivity analysis
Deposition
Acceso en línea:http://hdl.handle.net/20.500.12110/paper_15334880_v14_n5_p3902_Kleiman
Aporte de:
Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires

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