Ion kinetic energy distribution in a pulsed vacuum arc with a straight magnetic filter
In vacuum arcs of interest for film deposition the ion kinetic energy is of importance because it influences the coating properties. In this kind of discharge, the ions come out from the cathode spots with a high kinetic energy (20-150 eV). In the present work, we present measurements of vacuum arc...
Guardado en:
Autores principales: | Giuliani, L., Grondona, D., Kelly, H., Minotti, F. |
---|---|
Formato: | CONF |
Materias: | |
Acceso en línea: | http://hdl.handle.net/20.500.12110/paper_02811847_vT131_n_p_Giuliani |
Aporte de: |
Ejemplares similares
-
Ion kinetic energy distribution in a pulsed vacuum arc with a straight magnetic filter
Publicado: (2008) -
Characterization of the ion emission in a pulsed vacuum arc with an axial magnetic field
Publicado: (2003) -
Characterization of the ion emission in a pulsed vacuum arc with an axial magnetic field
por: Kelly, H., et al. -
On the dynamics of the plasma entry and guiding in a straight magnetized filter of a pulsed vacuum arc
por: Giuliani, L., et al. -
Kinetic model for the evaluation of spatial charge effects in retarding field analysers applied to vacuum arc devices
por: Kelly, H., et al.