Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology

The design of a phase-shift interferometer in the extreme ultraviolet (EUV) is described. The interferometer is expected to achieve a significantly higher precision as compared with similar instruments that utilize lasers in the visible range. The interferometer's design is specifically adapted...

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Autores principales:	Capeluto, María Gabriela, Marconi, Mario Carlos, Iemmi, Claudio César
Publicado:	2014
Materias:	Extreme ultraviolet lithography Interferometers Phase shift Extreme Ultraviolet Extreme ultraviolets High-precision Interferograms Phase-shift interferometer Phase-shifting interferometers Pulsed capillary discharges Visible range Pulsed lasers
Acceso en línea:	https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_1559128X_v_n7_p1274_Capeluto http://hdl.handle.net/20.500.12110/paper_1559128X_v_n7_p1274_Capeluto
Aporte de:	Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires

id	paper:paper_1559128X_v_n7_p1274_Capeluto
record_format	dspace
spelling	paper:paper_1559128X_v_n7_p1274_Capeluto2023-06-08T16:23:43Z Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology Capeluto, María Gabriela Marconi, Mario Carlos Iemmi, Claudio César Extreme ultraviolet lithography Interferometers Phase shift Extreme Ultraviolet Extreme ultraviolets High-precision Interferograms Phase-shift interferometer Phase-shifting interferometers Pulsed capillary discharges Visible range Pulsed lasers The design of a phase-shift interferometer in the extreme ultraviolet (EUV) is described. The interferometer is expected to achieve a significantly higher precision as compared with similar instruments that utilize lasers in the visible range. The interferometer's design is specifically adapted for its utilization with a table top pulsed capillary discharge EUV laser. The numerical model evaluates the errors in the interferograms and in the retrieved wavefront induced by the shot-to-shot fluctuations and pointing instabilities of the laser. © 2014 Optical Society of America. Fil:Capeluto, M.G. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Marconi, M.C. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Iemmi, C.C. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. 2014 https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_1559128X_v_n7_p1274_Capeluto http://hdl.handle.net/20.500.12110/paper_1559128X_v_n7_p1274_Capeluto
institution	Universidad de Buenos Aires
institution_str	I-28
repository_str	R-134
collection	Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA)
topic	Extreme ultraviolet lithography Interferometers Phase shift Extreme Ultraviolet Extreme ultraviolets High-precision Interferograms Phase-shift interferometer Phase-shifting interferometers Pulsed capillary discharges Visible range Pulsed lasers
spellingShingle	Extreme ultraviolet lithography Interferometers Phase shift Extreme Ultraviolet Extreme ultraviolets High-precision Interferograms Phase-shift interferometer Phase-shifting interferometers Pulsed capillary discharges Visible range Pulsed lasers Capeluto, María Gabriela Marconi, Mario Carlos Iemmi, Claudio César Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology
topic_facet	Extreme ultraviolet lithography Interferometers Phase shift Extreme Ultraviolet Extreme ultraviolets High-precision Interferograms Phase-shift interferometer Phase-shifting interferometers Pulsed capillary discharges Visible range Pulsed lasers
description	The design of a phase-shift interferometer in the extreme ultraviolet (EUV) is described. The interferometer is expected to achieve a significantly higher precision as compared with similar instruments that utilize lasers in the visible range. The interferometer's design is specifically adapted for its utilization with a table top pulsed capillary discharge EUV laser. The numerical model evaluates the errors in the interferograms and in the retrieved wavefront induced by the shot-to-shot fluctuations and pointing instabilities of the laser. © 2014 Optical Society of America.
author	Capeluto, María Gabriela Marconi, Mario Carlos Iemmi, Claudio César
author_facet	Capeluto, María Gabriela Marconi, Mario Carlos Iemmi, Claudio César
author_sort	Capeluto, María Gabriela
title	Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology
title_short	Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology
title_full	Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology
title_fullStr	Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology
title_full_unstemmed	Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology
title_sort	design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology
publishDate	2014
url	https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_1559128X_v_n7_p1274_Capeluto http://hdl.handle.net/20.500.12110/paper_1559128X_v_n7_p1274_Capeluto
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Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology

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