Nanopatterning in a compact setup using table top extreme ultraviolet lasers

The recent development of table top extreme ultraviolet (EUV) lasers have enabled new applications that so far were restricted to the use of large facilities. These compact sources bring now to the laboratory environment the capabilities that will allow a broader application of techniques related to...

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Autores principales:	Capeluto, María Gabriela, Marconi, Mario Carlos
Publicado:	2008
Materias:	EUV lasers Interferometric lithography Nanopatterning Photoresist Electron beam lithography Extreme ultraviolet lithography Interferometry Nanotechnology Photoresists Polymethyl methacrylates Capillary discharge lasers Extreme ultraviolet lasers Full width half maximum Hydrogen silsesquioxane Laboratory environment NanoPatterning Ultraviolet lasers
Acceso en línea:	https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_12303402_v16_n4_p444_Wachulak http://hdl.handle.net/20.500.12110/paper_12303402_v16_n4_p444_Wachulak
Aporte de:	Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires

id	paper:paper_12303402_v16_n4_p444_Wachulak
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spelling	paper:paper_12303402_v16_n4_p444_Wachulak2023-06-08T16:10:09Z Nanopatterning in a compact setup using table top extreme ultraviolet lasers Capeluto, María Gabriela Marconi, Mario Carlos EUV lasers Interferometric lithography Nanopatterning Photoresist Electron beam lithography Extreme ultraviolet lithography Interferometry Nanotechnology Photoresists Polymethyl methacrylates Capillary discharge lasers EUV lasers Extreme ultraviolet lasers Full width half maximum Hydrogen silsesquioxane Interferometric lithography Laboratory environment NanoPatterning Ultraviolet lasers The recent development of table top extreme ultraviolet (EUV) lasers have enabled new applications that so far were restricted to the use of large facilities. These compact sources bring now to the laboratory environment the capabilities that will allow a broader application of techniques related to nanotechnology and nanofabrication. In this paper we review the advances in the utilization of EUV lasers in nanopatterning. In particular we show results of the nanopatterning using a table-top capillary discharge laser producing 0.12-mJ laser pulses with 1.2-ns time duration at a wavelength λ = 46.9 nm. The nanopatterning was realized by interferometric lithography using a Lloyd's mirror interferometer. Two standard photoresists were used in this work, polymethyl methacrylate (PMMA) and hydrogen silsesquioxane (HSQ). Pillars with a full width half maximum (FWHM) diameter of 60 nm and holes with FWHM diameter of 130 nm were obtained over areas in excess of 500×500 μm2. © 2008 Versita Warsaw and Springer-Verlag Berlin Heidelberg. Fil:Capeluto, M.G. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Marconi, M.C. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. 2008 https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_12303402_v16_n4_p444_Wachulak http://hdl.handle.net/20.500.12110/paper_12303402_v16_n4_p444_Wachulak
institution	Universidad de Buenos Aires
institution_str	I-28
repository_str	R-134
collection	Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA)
topic	EUV lasers Interferometric lithography Nanopatterning Photoresist Electron beam lithography Extreme ultraviolet lithography Interferometry Nanotechnology Photoresists Polymethyl methacrylates Capillary discharge lasers EUV lasers Extreme ultraviolet lasers Full width half maximum Hydrogen silsesquioxane Interferometric lithography Laboratory environment NanoPatterning Ultraviolet lasers
spellingShingle	EUV lasers Interferometric lithography Nanopatterning Photoresist Electron beam lithography Extreme ultraviolet lithography Interferometry Nanotechnology Photoresists Polymethyl methacrylates Capillary discharge lasers EUV lasers Extreme ultraviolet lasers Full width half maximum Hydrogen silsesquioxane Interferometric lithography Laboratory environment NanoPatterning Ultraviolet lasers Capeluto, María Gabriela Marconi, Mario Carlos Nanopatterning in a compact setup using table top extreme ultraviolet lasers
topic_facet	EUV lasers Interferometric lithography Nanopatterning Photoresist Electron beam lithography Extreme ultraviolet lithography Interferometry Nanotechnology Photoresists Polymethyl methacrylates Capillary discharge lasers EUV lasers Extreme ultraviolet lasers Full width half maximum Hydrogen silsesquioxane Interferometric lithography Laboratory environment NanoPatterning Ultraviolet lasers
description	The recent development of table top extreme ultraviolet (EUV) lasers have enabled new applications that so far were restricted to the use of large facilities. These compact sources bring now to the laboratory environment the capabilities that will allow a broader application of techniques related to nanotechnology and nanofabrication. In this paper we review the advances in the utilization of EUV lasers in nanopatterning. In particular we show results of the nanopatterning using a table-top capillary discharge laser producing 0.12-mJ laser pulses with 1.2-ns time duration at a wavelength λ = 46.9 nm. The nanopatterning was realized by interferometric lithography using a Lloyd's mirror interferometer. Two standard photoresists were used in this work, polymethyl methacrylate (PMMA) and hydrogen silsesquioxane (HSQ). Pillars with a full width half maximum (FWHM) diameter of 60 nm and holes with FWHM diameter of 130 nm were obtained over areas in excess of 500×500 μm2. © 2008 Versita Warsaw and Springer-Verlag Berlin Heidelberg.
author	Capeluto, María Gabriela Marconi, Mario Carlos
author_facet	Capeluto, María Gabriela Marconi, Mario Carlos
author_sort	Capeluto, María Gabriela
title	Nanopatterning in a compact setup using table top extreme ultraviolet lasers
title_short	Nanopatterning in a compact setup using table top extreme ultraviolet lasers
title_full	Nanopatterning in a compact setup using table top extreme ultraviolet lasers
title_fullStr	Nanopatterning in a compact setup using table top extreme ultraviolet lasers
title_full_unstemmed	Nanopatterning in a compact setup using table top extreme ultraviolet lasers
title_sort	nanopatterning in a compact setup using table top extreme ultraviolet lasers
publishDate	2008
url	https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_12303402_v16_n4_p444_Wachulak http://hdl.handle.net/20.500.12110/paper_12303402_v16_n4_p444_Wachulak
work_keys_str_mv	AT capelutomariagabriela nanopatterninginacompactsetupusingtabletopextremeultravioletlasers AT marconimariocarlos nanopatterninginacompactsetupusingtabletopextremeultravioletlasers
_version_	1768546641363599360

Nanopatterning in a compact setup using table top extreme ultraviolet lasers

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