Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with tabletop extreme ultraviolet lasers

Arrays of nanodots and nanoholes were patterned with a highly coherent tabletop 46.9 nm laser on high resolution hydrogen silsesquioxane photoresist using multiple exposure interferometric lithography. The authors observed for λ=46.9 nm radiation a penetration depth in excess of 150 nm. This laser-b...

Descripción completa

Guardado en:
Detalles Bibliográficos
Publicado: 2007
Materias:
Extreme ultraviolet lasers
Hydrogen silsesquioxane
Interferometric lithography
Nanoscale patterning
High resolution electron microscopy
Interferometry
Photoresists
Ultraviolet radiation
Extreme ultraviolet lithography
Acceso en línea:https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_10711023_v25_n6_p2094_Wachulak
http://hdl.handle.net/20.500.12110/paper_10711023_v25_n6_p2094_Wachulak
Aporte de:
Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires
id paper:paper_10711023_v25_n6_p2094_Wachulak
record_format dspace
spelling paper:paper_10711023_v25_n6_p2094_Wachulak2023-06-08T16:04:43Z Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with tabletop extreme ultraviolet lasers Extreme ultraviolet lasers Hydrogen silsesquioxane Interferometric lithography Nanoscale patterning High resolution electron microscopy Interferometry Photoresists Ultraviolet radiation Extreme ultraviolet lithography Arrays of nanodots and nanoholes were patterned with a highly coherent tabletop 46.9 nm laser on high resolution hydrogen silsesquioxane photoresist using multiple exposure interferometric lithography. The authors observed for λ=46.9 nm radiation a penetration depth in excess of 150 nm. This laser-based extreme ultraviolet interferometric setup allows printing of 0.5×0.5 mm2 areas with different nanoscale patterns using a compact tabletop system and exposure times of tens of seconds. © 2007 American Vacuum Society. 2007 https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_10711023_v25_n6_p2094_Wachulak http://hdl.handle.net/20.500.12110/paper_10711023_v25_n6_p2094_Wachulak
institution Universidad de Buenos Aires
institution_str I-28
repository_str R-134
collection Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA)
topic Extreme ultraviolet lasers
Hydrogen silsesquioxane
Interferometric lithography
Nanoscale patterning
High resolution electron microscopy
Interferometry
Photoresists
Ultraviolet radiation
Extreme ultraviolet lithography
spellingShingle Extreme ultraviolet lasers
Hydrogen silsesquioxane
Interferometric lithography
Nanoscale patterning
High resolution electron microscopy
Interferometry
Photoresists
Ultraviolet radiation
Extreme ultraviolet lithography
Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with tabletop extreme ultraviolet lasers
topic_facet Extreme ultraviolet lasers
Hydrogen silsesquioxane
Interferometric lithography
Nanoscale patterning
High resolution electron microscopy
Interferometry
Photoresists
Ultraviolet radiation
Extreme ultraviolet lithography
description Arrays of nanodots and nanoholes were patterned with a highly coherent tabletop 46.9 nm laser on high resolution hydrogen silsesquioxane photoresist using multiple exposure interferometric lithography. The authors observed for λ=46.9 nm radiation a penetration depth in excess of 150 nm. This laser-based extreme ultraviolet interferometric setup allows printing of 0.5×0.5 mm2 areas with different nanoscale patterns using a compact tabletop system and exposure times of tens of seconds. © 2007 American Vacuum Society.
title Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with tabletop extreme ultraviolet lasers
title_short Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with tabletop extreme ultraviolet lasers
title_full Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with tabletop extreme ultraviolet lasers
title_fullStr Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with tabletop extreme ultraviolet lasers
title_full_unstemmed Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with tabletop extreme ultraviolet lasers
title_sort nanoscale patterning in high resolution hsq photoresist by interferometric lithography with tabletop extreme ultraviolet lasers
publishDate 2007
url https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_10711023_v25_n6_p2094_Wachulak
http://hdl.handle.net/20.500.12110/paper_10711023_v25_n6_p2094_Wachulak
_version_ 1768543909260034048

Ejemplares similares