SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4

The infrared multiphoton dissociation (IRMPD) of SiF4 in the presence of CH4 has been studied using a tunable CO2 TEA laser. The siliconated reaction products have been identified. A kinetic scheme has been proposed to explain the experimental results. The reaction rate constant of the trifluorosily...

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Guardado en:
Detalles Bibliográficos
Publicado: 2009
Materias:
Infrared multiphoton dissociation
Reaction rate
Silicon tetrafluoride
Trifluorosilyl
Acceso en línea:https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_10106030_v205_n2-3_p79_Alcaraz
http://hdl.handle.net/20.500.12110/paper_10106030_v205_n2-3_p79_Alcaraz
Aporte de:
Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires
id paper:paper_10106030_v205_n2-3_p79_Alcaraz
record_format dspace
spelling paper:paper_10106030_v205_n2-3_p79_Alcaraz2023-06-08T15:59:35Z SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4 Infrared multiphoton dissociation Reaction rate Silicon tetrafluoride Trifluorosilyl The infrared multiphoton dissociation (IRMPD) of SiF4 in the presence of CH4 has been studied using a tunable CO2 TEA laser. The siliconated reaction products have been identified. A kinetic scheme has been proposed to explain the experimental results. The reaction rate constant of the trifluorosilyl radical, SiF3, with CH4 has been obtained from the numerical solution of the differential equation system associated to the kinetic mechanism proposed as well as from non-linear regression methods. It has been additionally found that this reaction occurs through two channels. The relative importance of each and their reaction rate constants have been determined as well. © 2009 Elsevier B.V. All rights reserved. 2009 https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_10106030_v205_n2-3_p79_Alcaraz http://hdl.handle.net/20.500.12110/paper_10106030_v205_n2-3_p79_Alcaraz
institution Universidad de Buenos Aires
institution_str I-28
repository_str R-134
collection Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA)
topic Infrared multiphoton dissociation
Reaction rate
Silicon tetrafluoride
Trifluorosilyl
spellingShingle Infrared multiphoton dissociation
Reaction rate
Silicon tetrafluoride
Trifluorosilyl
SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4
topic_facet Infrared multiphoton dissociation
Reaction rate
Silicon tetrafluoride
Trifluorosilyl
description The infrared multiphoton dissociation (IRMPD) of SiF4 in the presence of CH4 has been studied using a tunable CO2 TEA laser. The siliconated reaction products have been identified. A kinetic scheme has been proposed to explain the experimental results. The reaction rate constant of the trifluorosilyl radical, SiF3, with CH4 has been obtained from the numerical solution of the differential equation system associated to the kinetic mechanism proposed as well as from non-linear regression methods. It has been additionally found that this reaction occurs through two channels. The relative importance of each and their reaction rate constants have been determined as well. © 2009 Elsevier B.V. All rights reserved.
title SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4
title_short SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4
title_full SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4
title_fullStr SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4
title_full_unstemmed SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4
title_sort sif4 ir photodissociation: gas phase reactions of sif3 with ch4
publishDate 2009
url https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_10106030_v205_n2-3_p79_Alcaraz
http://hdl.handle.net/20.500.12110/paper_10106030_v205_n2-3_p79_Alcaraz
_version_ 1768544787069140992

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