Table top nanopatterning with extreme ultraviolet laser illumination

Patterning with extreme ultraviolet light generated by a compact, bright laser source operating at a wavelength of 46.9 nm is demonstrated using two complementary approaches: multiple beam interferometric lithography and de-magnifying projection. Features with sizes ranging from 370 nm to 60 nm were...

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Detalles Bibliográficos
Autores principales:	Capeluto, María Gabriela, Marconi, Mario Carlos, Iemmi, Claudio César
Publicado:	2007
Materias:	EUV lasers Interferometric lithography Nanopatterning Table top photolithography Laser interferometry Lithography Nanotechnology Polymethyl methacrylates Ultraviolet radiation Wavelength Lasers
Acceso en línea:	https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_01679317_v84_n5-8_p721_Capeluto http://hdl.handle.net/20.500.12110/paper_01679317_v84_n5-8_p721_Capeluto
Aporte de:	Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires

id	paper:paper_01679317_v84_n5-8_p721_Capeluto
record_format	dspace
spelling	paper:paper_01679317_v84_n5-8_p721_Capeluto2023-06-08T15:17:06Z Table top nanopatterning with extreme ultraviolet laser illumination Capeluto, María Gabriela Marconi, Mario Carlos Iemmi, Claudio César EUV lasers Interferometric lithography Nanopatterning Table top photolithography Laser interferometry Lithography Nanotechnology Polymethyl methacrylates Ultraviolet radiation Wavelength EUV lasers Interferometric lithography Nanopatterning Table top photolithography Lasers Patterning with extreme ultraviolet light generated by a compact, bright laser source operating at a wavelength of 46.9 nm is demonstrated using two complementary approaches: multiple beam interferometric lithography and de-magnifying projection. Features with sizes ranging from 370 nm to 60 nm were printed in a few seconds in poly-methyl methacrylate resist. These proof-of-principle experiments demonstrate practical table-top nanopatterning tools based on extreme ultraviolet lasers for nanotechnology applications. © 2007 Elsevier B.V. All rights reserved. Fil:Capeluto, M.G. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Marconi, M.C. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. Fil:Iemmi, C. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina. 2007 https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_01679317_v84_n5-8_p721_Capeluto http://hdl.handle.net/20.500.12110/paper_01679317_v84_n5-8_p721_Capeluto
institution	Universidad de Buenos Aires
institution_str	I-28
repository_str	R-134
collection	Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA)
topic	EUV lasers Interferometric lithography Nanopatterning Table top photolithography Laser interferometry Lithography Nanotechnology Polymethyl methacrylates Ultraviolet radiation Wavelength EUV lasers Interferometric lithography Nanopatterning Table top photolithography Lasers
spellingShingle	EUV lasers Interferometric lithography Nanopatterning Table top photolithography Laser interferometry Lithography Nanotechnology Polymethyl methacrylates Ultraviolet radiation Wavelength EUV lasers Interferometric lithography Nanopatterning Table top photolithography Lasers Capeluto, María Gabriela Marconi, Mario Carlos Iemmi, Claudio César Table top nanopatterning with extreme ultraviolet laser illumination
topic_facet	EUV lasers Interferometric lithography Nanopatterning Table top photolithography Laser interferometry Lithography Nanotechnology Polymethyl methacrylates Ultraviolet radiation Wavelength EUV lasers Interferometric lithography Nanopatterning Table top photolithography Lasers
description	Patterning with extreme ultraviolet light generated by a compact, bright laser source operating at a wavelength of 46.9 nm is demonstrated using two complementary approaches: multiple beam interferometric lithography and de-magnifying projection. Features with sizes ranging from 370 nm to 60 nm were printed in a few seconds in poly-methyl methacrylate resist. These proof-of-principle experiments demonstrate practical table-top nanopatterning tools based on extreme ultraviolet lasers for nanotechnology applications. © 2007 Elsevier B.V. All rights reserved.
author	Capeluto, María Gabriela Marconi, Mario Carlos Iemmi, Claudio César
author_facet	Capeluto, María Gabriela Marconi, Mario Carlos Iemmi, Claudio César
author_sort	Capeluto, María Gabriela
title	Table top nanopatterning with extreme ultraviolet laser illumination
title_short	Table top nanopatterning with extreme ultraviolet laser illumination
title_full	Table top nanopatterning with extreme ultraviolet laser illumination
title_fullStr	Table top nanopatterning with extreme ultraviolet laser illumination
title_full_unstemmed	Table top nanopatterning with extreme ultraviolet laser illumination
title_sort	table top nanopatterning with extreme ultraviolet laser illumination
publishDate	2007
url	https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_01679317_v84_n5-8_p721_Capeluto http://hdl.handle.net/20.500.12110/paper_01679317_v84_n5-8_p721_Capeluto
work_keys_str_mv	AT capelutomariagabriela tabletopnanopatterningwithextremeultravioletlaserillumination AT marconimariocarlos tabletopnanopatterningwithextremeultravioletlaserillumination AT iemmiclaudiocesar tabletopnanopatterningwithextremeultravioletlaserillumination
_version_	1768543699627671552

Table top nanopatterning with extreme ultraviolet laser illumination

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