Stochastic Process Variation in Deep-Submicron CMOS Circuits and Algorithms /
One of the most notable features of nanometer scale CMOS technology is the increasing magnitude of variability of the key device parameters affecting performance of integrated circuits. The growth of variability can be attributed to multiple factors, including the difficulty of manufacturing control...
Guardado en:
Autor principal: | |
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Formato: | Libro electrónico |
Lenguaje: | Inglés |
Publicado: |
Dordrecht :
Springer Netherlands : Imprint: Springer,
2014.
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Colección: | Springer Series in Advanced Microelectronics,
48 |
Materias: | |
Acceso en línea: | http://dx.doi.org/10.1007/978-94-007-7781-1 |
Aporte de: | Registro referencial: Solicitar el recurso aquí |
Tabla de Contenidos:
- 1 Introduction
- 2 Random Process Variation in Deep-Submicron CMOS
- 3 Electronic Noise in Deep-Submicron CMOS
- 4 Thermal Effects in Deep-Submicron CMOS
- 5 Circuit Solutions
- 6 Conclusions and Recommendations
- Appendix. References
- Acknowledgement
- About the Author.