Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System

This book provides for the first time a good understanding of the etching profile technologies that do not disturb the plasma. Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of re...

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Detalles Bibliográficos
Autor principal: Samukawa, Seiji
Formato: Libro electrónico
Lenguaje:Inglés
Publicado: Tokyo : Springer Japan : Imprint: Springer, 2014.
Colección:SpringerBriefs in Applied Sciences and Technology,
Materias:
Plasma (Ionized gases).
Nanoscale science.
Nanoscience.
Nanostructures.
Engineering.
Microengineering.
Nanotechnology.
Plasma Physics.
Semiconductors.
Acceso en línea:http://dx.doi.org/10.1007/978-4-431-54795-2
Aporte de:Registro referencial: Solicitar el recurso aquí
Bibliotecas (ING-UNLP) de Universidad Nacional de La Plata

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