The photoelastic effect and its applications : symposium, Belgium, September 10-16, 1973 : [proceedings] /

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Detalles Bibliográficos
Autores Corporativos: Symposium on the Photoelastic Effect and Its Applications Ottignies, Belgium, International Union of Theoretical and Applied Mechanics, Permanent Committee for Stress Analysis, Society for Experimental Stress Analysis
Otros Autores: Kestens, Jean
Formato: Acta de conferencia Libro
Lenguaje:Inglés
Publicado: Berlin ; New York : Springer-Verlag, 1975.
Materias:
Aporte de:Registro referencial: Solicitar el recurso aquí
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245 1 4 |a The photoelastic effect and its applications :  |b symposium, Belgium, September 10-16, 1973 : [proceedings] /  |c editor, Jean Kestens ; with the cooperation of the Permanent Committee for Stress Analysis and the Society for Experimental Stress Analysis (SESA). 
260 # # |a Berlin ;  |a New York :  |b Springer-Verlag,  |c 1975. 
300 # # |a xi, 638 p. :  |b il. ;  |c 24 cm. 
020 # # |a 0387072780 
111 2 # |a Symposium on the Photoelastic Effect and Its Applications  |d (1973 :  |c Ottignies, Belgium) 
700 1 # |a Kestens, Jean. 
710 2 # |a International Union of Theoretical and Applied Mechanics. 
710 2 # |a Permanent Committee for Stress Analysis. 
710 2 # |a Society for Experimental Stress Analysis. 
650 # 0 |a Photoelasticity  |v Congresses. 
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029 # # |a NLGGC  |b 78325203X 
050 0 0 |a TA418.12  |b .S93 1973 
049 # # |a AR5A 
504 # # |a Incluye referencias bibliográficas. 
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500 # # |a Cabecera de portada: International Union of Theoretical and Applied Mechanics. 
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