SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4

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The infrared multiphoton dissociation (IRMPD) of SiF4 in the presence of CH4 has been studied using a tunable CO2 TEA laser. The siliconated reaction products have been identified. A kinetic scheme has been proposed to explain the experimental results. The reaction rate constant of the trifluorosily...

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Detalles Bibliográficos
Autores principales: Alcaraz, A.N., Codnia, J., Azcárate, M.L.
Formato: JOUR
Materias:
Infrared multiphoton dissociation
Reaction rate
Silicon tetrafluoride
Trifluorosilyl
Acceso en línea:http://hdl.handle.net/20.500.12110/paper_10106030_v205_n2-3_p79_Alcaraz
Aporte de:
Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires

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