A simple three step method for selective placement of organic groups in mesoporous silica thin films

Selective functionalization of mesoporous silica thin films was achieved using a three step method. The first step consists in an outer surface functionalization, followed by washing off the structuring agent (second step), leaving the inner surface of the pores free to be functionalized in the thir...

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Detalles Bibliográficos
Autores principales:	Franceschini, E.A., Llave, E.D.L., Williams, F.J., Soler-Illia, G.J.A.A.
Formato:	JOUR
Materias:	Nanostructures Sol-gel growth Surface properties Thin films Vapor deposition X-ray photo-emission spectroscopy (XPS) Deposition Emission spectroscopy Mesoporous materials Photoelectron spectroscopy Silica Sol-gels X ray photoelectron spectroscopy Ellipsometric porosimetry Functionalized silica Mesoporous silica film Mesoporous silica thin films Mesoporous thin films Selective functionalization X ray photoemission spectroscopy
Acceso en línea:	http://hdl.handle.net/20.500.12110/paper_02540584_v169_n_p82_Franceschini
Aporte de:	Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires

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