SIM.EM – S9b, 1 Ω and 10 kΩ : 2012 Resistance Bilateral Comparison between SIM/COOMET Laboratories. Comparison of Resistance Standards at 1 Ω and 10 kΩ between INIMET (Cuba) and INTI (Argentina)

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Detalles Bibliográficos
Autores principales:	Tonina, A., Currás, M., Navarro, M.
Formato:	article
Lenguaje:	Inglés
Publicado:	IOP Publishing 2014
Materias:	Sistema Interamericano de Metrología Metrología Calibración Patrones Comparadores Resistores
Acceso en línea:	http://www-biblio.inti.gob.ar:80/gsdl/collect/inti/index/assoc/HASH0117/a1d103de.dir/doc.pdf
Aporte de:	Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI) de Instituto Nacional de Tecnología Industrial (INTI)

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